Lens Performance Prediction after a Partial Lens Correction in DUV Lithography Systems

This thesis, written as part of an internship taking place at the lithography machines manufacturer ASML, explores the opportunity to predict the final lens performance of Deep Ultraviolet (DUV) systems after executing only a partial Lens Correction. The relationship between the partial and final states is modeled using a robust Generalized Linear Model, as described by Cantoni and Ronchetti (2001). The findings indicate an overall satisfactory performance, with a Mean Absolute Percentage Error ranging between 11.1% and 30.6%. However, due to the poor correlation between the two states, the Absolute Percentage Error for some units tends to be excessively high, even exceeding 100%. Due to this inconsistency, the model's performance does not meet the company's business needs. Nonetheless, this paper sets an important ground for future advancements on the subject.